ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2015/08
形態種別	論文
査読	査読あり
標題	Surface morphology changes and deuterium retention in Toughened, Fine-grained Recrystallized Tungsten under high-flux irradiation conditions
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	463,pp.1037-1040
国際共著	国際共著
著者・共著者	M. Oya,H. T. Lee,Y. Ueda,H. Kurishita,M. Oyaidzu,T. Hayashi,N. Yoshida,T. W. Morgan,G. De Temmerman
概要	Surface morphology changes and deuterium (D) retention in Toughened, Fine-Grained Recrystallized Tungsten (TFGR W) with TaC dispersoids (W-TaC) and pure tungsten exposed to D plasmas to a fluence of 10(26) D/m(2) s were studied as a function of the D ion flux (10(22)-10(24) D/m(2) s). As the flux increased from 10(22) D/m(2) s to 10(24) D/m(2) s, the numbers of blisters increased for both materials. However, smaller blisters were observed on W-TaC compared to pure W. In W-TaC, cracks beneath the surface along grain boundaries were observed, which were comparable to the blister sizes. The reason for the smaller blister sizes may arise from smaller grain sizes of W-TaC. In addition, reduction of the D retention in W-TaC was observed for higher flux exposures. D depth profiles indicate this reduction arises due to decrease in trapping in the bulk. (C) 2014 Elsevier B.V. All rights reserved.
DOI	10.1016/j.jnucmat.2014.11.124
ISSN	0022-3115/1873-4820