ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
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言語種別 | 英語 |
発行・発表の年月 | 2015/08 |
形態種別 | 論文 |
査読 | 査読あり |
標題 | Plasma wall interaction in long-pulse helium discharge in LHD - Microscopic modification of the wall surface and its impact on particle balance and impurity generation |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | JOURNAL OF NUCLEAR MATERIALS |
掲載区分 | 国外 |
出版社・発行元 | ELSEVIER SCIENCE BV |
巻・号・頁 | 463,pp.91-98 |
著者・共著者 | M. Tokitani,H. Kasahara,S. Masuzaki,G. Motojima,M. Shoji,Y. Ueda,N. Yoshida,Y. Yoshimura,K. Nagasaki,N. Ashikawa,T. Mutoh,H. Yamada,S. Nagata |
概要 | Ultra-long-pulse helium discharge with ion and electron cyclotron heating (ICH + ECH) in the Large Helical Device (LHD) was achieved in a 48 min plasma (n(e) similar to 1.2 x 10(19) m(-3), T-i,T-e similar to 2 keV) with an average heating power of 1.2 MW. The temperature of the first-wall surface during discharges remained at nearly room temperature. However, even in ultra-long-pulse helium discharge, the discharge conditions cannot be said to be in a steady-state, because of two major issues interrupting the steady-state condition. One is the "dynamic change of the wall pumping rate" and the other is the "termination of the discharge with the exfoliation of the mixed-material deposition layers." |
DOI | 10.1016/j.jnucmat.2014.12.062 |
ISSN | 0022-3115/1873-4820 |