ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2020/12
形態種別	論文
査読	査読あり
標題	Improved hydrogen gas sensing performance of WO3 films with fibrous nanostructured surface
執筆形態	共著・編著（代表編著を除く）
掲載誌名	APPLIED SURFACE SCIENCE
掲載区分	国外
出版社・発行元	ELSEVIER
巻・号・頁	532
著者・共著者	Yoshihiro Kimura,Kenzo Ibano,Kenya Uehata,Issei Hirai,Heun Tae Lee,Yoshio Ueda
概要	Characteristic fibrous nanostructure, known as fuzz, is formed by a helium plasma exposure of metal surfaces at certain temperatures. Applications of He-induced nanostructure to catalysts and sensors are promising because of its remarkably increased surface area. In this study, WO3 thin films with the fibrous nanostructure were prepared and their performance as a semiconductor-type gas sensor to trace hydrogen gas was evaluated. Change in the electrical resistivity between electrodes on the surface during a 100 ppm hydrogen gas flow and a dry air flow was measured at a sample temperature of 200 degrees C to 400 degrees C. Remarkably improved sensitivities compared with a plane WO3 film sensor were observed for fuzzy WO3 film sensors. The highest response of 99.5% was achieved at the ambient temperature of 300 degrees C.
DOI	10.1016/j.apsusc.2020.147274
ISSN	0169-4332/1873-5584