ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1986
形態種別	論文
査読	査読あり
標題	Initial results of RFP experiments in REPUTE-1
執筆形態	共著・編著（代表編著を除く）
掲載誌名	Plasma Physics and Controlled Fusion
掲載区分	国外
巻・号・頁	28(5),pp.805-812
著者・共著者	N. Asakura,T. Fujita,K. Hattori,N. Inoue,S. Ishida,Y. Kamada,S. Matsuzuka,K. Miyamoto,J. Morikawa,Y. Nagayama,H. Nihei,S. Shinohara,H. Toyama,Y. Ueda,K. Yamagishi,Z. Yoshida
概要	Experiments of a reversed field pinch device REPUTE-1 constructed in University of Tokyo started in 1984. The conductivity electron temperature and the line-averaged electron density increase approximately linearly with the increase of plasma current in the range up to 240 kA. The study of the effect of the bias toroidal field on the discharge characteristics shows that a higher bias field gives lower resistivity and a higher flat top plasma current. The toroidal flux at the current flat top tends to be a selective value independent of the initial bias field.
DOI	10.1088/0741-3335/28/5/006
ISSN	0741-3335