ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
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発行・発表の年月 | 1993 |
形態種別 | 紀要(First author) |
査読 | 査読あり |
標題 | Production of mixed neutral beam of helium and hydrogen for plasma diagnostics |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | Technology report of Osaka University |
掲載区分 | 国内 |
巻・号・頁 | 43(2136),103-108頁 |
担当区分 | 筆頭著者 |
著者・共著者 | Yoshio Ueda,Mashiro Nishikawa,Seiichi Goto |
概要 | For the time dependent electron temperature measurement of plasmas, the beam attenuation method using mixed neutral beam of helium and hydrogen is proposed. To optimize the neutral beam source condition for the measurement, ion species ratio of the mixed beam extracted from the bucket type ion source is measured as a function of the helium concentration of the source discharge gas. Taking neutralization efficiency in the beam drift chamber and neutral beam stripping efficiency in the particle detector into account, the helium concentration in the source should be around 0.95. |
ISSN | 0030-6177 |