ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1994/08
形態種別	論文
査読	査読あり
標題	EFFECTS OF SHEATH POTENTIAL OF SOURCE PLASMA ON CHARACTERISTICS OF LOW-ENERGY BEAM EXTRACTION
執筆形態	共著・編著（代表編著を除く）
掲載誌名	REVIEW OF SCIENTIFIC INSTRUMENTS
掲載区分	国外
出版社・発行元	AMER INST PHYSICS
巻・号・頁	65(8),pp.2587-2593
担当区分	筆頭著者
著者・共著者	Y UEDA,Y SAKASHITA,T YOSHIKAWA,M ISOBE,M NISHIKAWA,S GOTO
概要	In order to obtain a high brightness ion beam from a plasma ion source in the low energy region (150 eV), the effects of sheath potential on the ion beam characteristics such as beam divergence and brightness have been studied experimentally. A bucket-type ion source (magnetic multicusp ion source) with an accel-decel triode extraction system is used for the experiment. Bias voltage between a discharge chamber and a positive (plasma) electrode is applied for sheath potential control. Two types of electrode systems have been examined, such as straight hole aperture (S type) and recessed hole aperture (R type), and have found that the effects of the bias voltage on the beam characteristics depend on the type of aperture and the deceleration voltage. For an S-type system, the application of bias voltage improves the beam performance in a low deceleration voltage (-600 V), but not in a high deceleration voltage (-1600 V).
DOI	10.1063/1.1144656
ISSN	0034-6748
NAID	30015955575