ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
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言語種別 | 英語 |
発行・発表の年月 | 1996/01 |
形態種別 | 論文 |
査読 | 査読あり |
標題 | Reduction of radiation-enhanced sublimation of graphite under high flux beam irradiation |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | JOURNAL OF NUCLEAR MATERIALS |
掲載区分 | 国外 |
出版社・発行元 | ELSEVIER SCIENCE BV |
巻・号・頁 | 227(3),pp.251-258 |
担当区分 | 筆頭著者 |
著者・共著者 | Y Ueda,K Nakano,Y Ohtsuka,M Isobe,S Goto,M Nishikawa |
概要 | Radiation-enhanced sublimation (RES) of isotropic graphite was studied under high flux beam irradiation. Irradiation was performed with a 5 keV Ar beam with a maximum flux of 1.5 x 10(21) m(-2) s(-1), about two orders of magnitude higher than that of previous beam experiments. It is found that the total erosion yield of isotropic graphite at 1980 K under high flux conditions of 1 x 10(21) m(-2) s(-1) is reduced to a value of about 3 in comparison with a yield of 5.9 under low flux conditions of 3.5 x 10(19) m(-2) s(-1). The dependence of the RES yield (total yield subtracted by physical sputtering yield) on the flux phi (phi > 1 x 10(20) m(-2) s(-1)) is as phi(-0.26), which is much stronger than that obtained in the low flux region (phi(-0.07), phi < 1 x 10(19) m(-2) s(-1)). The RES model based on diffusion and annihilation of C self-interstitials including stable defects for the sinks of interstitials is discussed in terms of the flux dependence of RES yield. |
DOI | 10.1016/0022-3115(95)00158-1 |
ISSN | 0022-3115 |
NAID | 80008808396 |