ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1996/03
形態種別	論文
査読	査読あり
標題	Production of very low energy and high brightness ion beam
執筆形態	共著・編著（代表編著を除く）
掲載誌名	REVIEW OF SCIENTIFIC INSTRUMENTS
掲載区分	国外
出版社・発行元	AMER INST PHYSICS
巻・号・頁	67(3),pp.1393-1395
著者・共著者	T Yoshikawa,S Nakamura,Y Ueda,S Goto
概要	In order to produce high brightness beam at energies below 100 eV, the effects of high deceleration voltage in a triode extraction system and plasma potential have been studied. Although the application of high deceleration voltage caused beam spreading, beam brightness was increased at least up to accel-decel ratio of 80. It is found that the reduction of sheath potential of the source plasma caused the increase in beam brightness under high deceleration voltage condition. In particular, it is desirable to reduce sheath potential at the energy below 50 eV because this potential is comparable to external applied acceleration voltage. (C) 1996 American Institute of Physics.
DOI	10.1063/1.1146679
ISSN	0034-6748/1089-7623