ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1998/06
形態種別	論文
査読	査読あり
標題	Effect of substrate potential on plasma parameters of magnetic multicusp plasma source
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
掲載区分	国内
出版社・発行元	JAPAN J APPLIED PHYSICS
巻・号・頁	37(6A),pp.3508-3513
担当区分	筆頭著者
著者・共著者	Y Ueda,M Ito,T Yoshikawa,S Goto
概要	The effect of substrate potential on plasmas produced in a magnetic multicusp plasma source has been studied experimentally. Plasma parameters such as electron temperature and plasma potential are estimated from electron energy distribution function numerically calculated from probe current-voltage characteristics. For a substrate potential of -150 V with respect to the source chamber, which is much lower than substrate Heating potentials, the plasma parameters are not affected by the application of the potential. However, for the case where the substrate is shorted with the source chamber, the high energy component of electrons significantly decreases in comparison with the floating case leading to the reduction of electron temperature.
DOI	10.1143/JJAP.37.3508
ISSN	0021-4922