ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1998/10
形態種別	論文
査読	査読あり
標題	Ion reflection and sputtering at tungsten surface exposed to edge plasmas in TEXTOR
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	258(PART 1 A),pp.1055-1059
国際共著	国際共著
著者・共著者	K Ohya,J Kawata,T Tanabe,M Wada,Y Ueda,Philipps, V,B Unterberg,A Pospieszczyk,B Schweer,F Weschenfelder,N Noda
概要	Ion reflection and sputtering at a W test limiter under simultaneous bombardment with C and O ions, as well as D ions, in TEXTOR edge-plasmas are investigated using a Monte Carlo simulation model which combines dynamic composition change in the surface layer with transport of emitted particles in the plasma. The main aim of this work is to discuss the prompt redeposition process on the limiter and the impurity transport in the edge plasma. With increasing plasma density, the effective sputtering yields of W and deposited C considerably decrease due to the increase in the number of redeposited particles, in addition to the decrease in the yields due to the simultaneous decrease in the plasma temperature.
DOI	10.1016/S0022-3115(98)00083-X
ISSN	0022-3115