ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1999/03
形態種別	論文
査読	査読あり
標題	Internal stress induced in the process of boron coating
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	266,pp.1108-1112
著者・共著者	H Kemi,C Sasaki,M Kitamura,N Satomi,Y Ueda,M Nishikawa
概要	Internal stresses induced in boron films formed by vacuum deposition were studied to find the generation mechanism of compressive stresses by an optically levered laser method. It a as found that the internal stresses of boron thin films changed from tensile to compressive with increasing substrate temperatures and decreasing deposition rates. Deliberate addition of oxygen gas in an atmosphere with a pressure of 0.02 mTorr did not clearly change internal stresses, though oxygen content was increased. According to the observation by a transmission electron microscope (TEM), the film structure was in an amorphous state based on icosahedral subunits. An interatomic distance for the high deposition rate (0.5 nm/s) was slightly larger by 1.7% than that for the low deposition rate (0.06 nm/s). This result seems consistent with a film formation model based on adatom migration. (C) 1999 Elsevier Science B.V. All rights reserved.
DOI	10.1016/S0022-3115(98)00856-3
ISSN	0022-3115