ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2000/12
形態種別	論文
査読	査読あり
標題	Mechanism of chemical sputtering of graphite under high flux deuterium bombardment
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	282(2-3),pp.216-222
担当区分	筆頭著者
著者・共著者	Y Ueda,T Sugai,Y Ohtsuka,M Nishikawa
概要	Chemical sputtering of graphite materials (isotropic graphite and carbon fiber composite) was studied by irradiation of 5 keV D-3(+) beam with a flux up to 4 x 10(21) m(-2) s(-1), which is more than one order magnitude higher than previous low flux beam experiments (<10(20) m(-2) s(-1)). The chemical sputtering yield was obtained from measurements of the released methane signal with a quadrupole mass analyser. It was found that the methane yield at peak temperatures is almost independent of flux from 5 x 10(20) to 4 x 10(21) m(-2) s(-1). Peak temperatures range between 900 and 1000 K, which is higher than those of the previous low flux experiments (<900 K, < 10(20) m(-2) s(-1)). By comparing our experimental results with calculation results based on Roth's model, the annealing effect of radiation damage to prevent methyl group formation appears to be unimportant. (C) 2000 Elsevier Science B.V. All rights reserved.
DOI	10.1016/S0022-3115(00)00410-4
ISSN	0022-3115
NAID	80012163951