ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
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言語種別 | 英語 |
発行・発表の年月 | 2002/04 |
形態種別 | 論文 |
査読 | 査読あり |
標題 | Development of new steady-state, low-energy, and high-flux ion beam test device |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | REVIEW OF SCIENTIFIC INSTRUMENTS |
掲載区分 | 国外 |
出版社・発行元 | AMER INST PHYSICS |
巻・号・頁 | 73(4),pp.1741-1745 |
著者・共著者 | T Shimada,Y Ueda,A Sagara,M Nishikawa |
概要 | A new steady-state, low-energy, and high-flux ion beam test device has been developed to study erosion, re-deposition, and hydrogen retention mechanisms of plasma facing materials under high flux conditions. Source plasma was produced by electron cyclotron resonance discharge with 2.45 GHz microwave. Ion extraction was made by spherical multiaperture triode electrodes to obtain high ion flux at the focal point. Ion extraction aperture geometry was designed so that high current density can be obtained in the case of low energy (<500 eV) by applying high deceleration voltage. It was demonstrated that low-energy and high-flux ion beam can be produced by increasing deceleration voltage with the fixed acceleration voltage (beam energy). In the case of hydrogen beam energy of 300 eV, beam power density has rapidly increased with a deceleration voltage over accel-decel ratio 4, and maximum beam flux is 4.1x10(20) H/m(2) s. |
DOI | 10.1063/1.1461873 |
ISSN | 0034-6748 |
NAID | 80015212463 |