ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
|
言語種別 | 英語 |
発行・発表の年月 | 2003/12 |
形態種別 | 論文 |
査読 | 査読あり |
標題 | Dynamic behavior of tungsten surfaces due to simultaneous impact of hydrogen and carbon ion beam |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS |
掲載区分 | 国内 |
出版社・発行元 | INST PURE APPLIED PHYSICS |
巻・号・頁 | 42(12),pp.7529-7535 |
著者・共著者 | R Kawakami,T Shimada,Y Ueda,M Nishikawa |
概要 | By using a simulation code for ion-solid interactions, EDDY, the dynamical behavior of W surfaces irradiated simultaneously with H+ and C+ impurity has been studied. This code models the fluence evolution of composition changes between C and W at the irradiated surface, which results from sputtering erosion and impurity deposition. The result has been described in terms of C impurity concentration in the irradiation. It has been compared with experimental data obtained by an ion beam irradiation device. In particular, the C impurity concentration has an important role in erosion/deposition at the W surface. As the C impurity concentration increases, the erosion is enhanced. ing fluence. This results from a growth of a local peak at around a depth of 20 nm in the depth profile of the deposited C. |
DOI | 10.1143/JJAP.42.7529 |
ISSN | 0021-4922 |