ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2005/03
形態種別	論文
査読	査読あり
標題	Hydrogen blister formation and cracking behavior for various tungsten materials
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	337(1-3),pp.1010-1014
担当区分	筆頭著者
著者・共著者	Y Ueda,T Funabiki,T Shimada,K Fukumoto,H Kurishita,M Nishikawa
概要	In order to study hydrogen blistering and subsequent cracking behavior of pure W, K-doped W, and La2O3-doped W, 1 keV H-3(+) (main ion components) ion beams were irradiated at 653 K to fluences up to 1 X 10(25) H/m(2). Two pre-irradiation heat treatments were done for stress relief (900 degrees C) and recrystallization (1300 degrees C for pure W and 1500 degrees C for K-doped and La2O3-doped W). It was found that blister characteristics and cracking behavior strongly depended on microstructures and dopant materials. For W materials with layered microstructure, blister shapes were mostly spherical-like, while for W materials with recrystallized (or disordered) microstructures, blisters had complicated plateau-like shapes with many cracks. Addition of K or La2O3 dopants increased the number of blisters and exfoliations for both stress relieved and recrystallized W. (c) 2004 Elsevier B.V. All rights reserved.
DOI	10.1016/j.jnucmat.2004.10.077
ISSN	0022-3115