ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2006/02
形態種別	論文
査読	査読あり
標題	Carbon impurity behavior on plasma facing surface of tungsten
執筆形態	共著・編著（代表編著を除く）
掲載誌名	FUSION ENGINEERING AND DESIGN
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE SA
巻・号・頁	81(1-7),pp.233-239
担当区分	筆頭著者
著者・共著者	Y Ueda,M Fukumoto,Sawamura, I,D Sakizono,T Shimada,M Nishikawa
概要	In order to study the behavior of carbon ions implanted together with hydrogen ions into tungsten, 1 keV H-3(+) (main component) with 0.1-0.8% of carbon ions were irradiated to pure sintered tungsten and depth profiles of carbon at the tungsten surface were measured. Carbon depth distributions at less than about 1000 K were much broader than the carbon ion range distributions, which could be attributed mainly to recoil implantation. Most of injected carbon atoms formed WC (not W2C) for both C similar to 0.1% and similar to 0.8% cases, which is different from the chemical states of carbon atoms thermally diffused into the bulk tungsten (W2C)Enhanced sputtering of carbon atoms at the tungsten surface was observed at 913 K, which might be owing to a low chemical sputtering yield for carbon. (c) 2005 Elsevier B.V. All rights reserved.
DOI	10.1016/j.fusengdes.2005.08.047
ISSN	0920-3796