ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2009/08
形態種別	論文
査読	査読あり
標題	THERMOPHYSICAL PROPERTIES AND MICROSTRUCTURE OF PLASMA-SPRAYED TUNGSTEN COATING ON LOW ACTIVATION MATERIALS
執筆形態	共著・編著（代表編著を除く）
掲載誌名	FUSION SCIENCE AND TECHNOLOGY
掲載区分	国外
出版社・発行元	AMER NUCLEAR SOC
巻・号・頁	56(2),pp.1053-1057
著者・共著者	Takuya Nagasaka,Ryuta Kasada,Akihiko Kimura,Yoshio Ueda,Takeo Muroga
概要	Tungsten (W) coating on various low activation materials, such as ferritic steel (F82H), oxide dispersion strengthened (ODS) steel, and vanadium alloy NIFS-HEAT-2 (NH2) was successful v demonstrated by the vacuum plasma spray (VPS) process. Void and crack-type defects were observed in VPS-W The mass density of VPS-W at room temperature (R T) was similar to 90% of the bulk W (sintered W). The thermal diffusivity and thermal conductivity of VPS-W from R T to 800 degrees C were 30 similar to 50% of the bulk W, while the linear expansion coefficient and specific heat of VPS-W were similar to the bulk W. The thermal conductivity of VPS-W was signficantly lower than the bulk W, but was still larger than the NH2 substrate. There was no significant thermal contact resistance at the interface between W coating and NH2 substrate. Thus, the heat transfer properties of NH2 will not be degraded by the W coating with the VPS process.
DOI	10.13182/FST56-1053
ISSN	1536-1055