ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	1997
形態種別	論文
査読	査読あり
標題	Sputtering of high-Z test limiters by simultaneous bombardment of carbon, oxygen and deuterium ions in TEXTOR
執筆形態	共著・編著（代表編著を除く）
掲載誌名	ICPP 96 CONTRIBUTED PAPERS - PROCEEDINGS OF THE 1996 INTERNATIONAL CONFERENCE ON PLASMA PHYSICS, VOLS 1 AND 2
出版社・発行元	JAPAN SOCIETY PLASMA SCIENCE &NUCLEAR FUSION RESEARCH
巻・号・頁	pp.650-653
国際共著	国際共著
著者・共著者	K Ohya,J Kawata,T Tanabe,Philipps, V,B Unterberg,A Pospieszczyk,B Schweer,N Noda,Y Ueda,M Wada
概要	Sputtering of a W test limiter by simultaneous bombardment with impurity C and O ions, as well as fuel D ions, in TEXTOR is investigated using a Monte Carlo simulation which takes into account dynamic composition change in the surface layer and transport of sputtered atoms in the edge plasma. The implantation of C ions causes a lowering in sputtering of W and additional sputtering of implanted C. In spite of formation of a C layer near the surface, the W surface is eroded due to sputtering of implanted C by D ions, as well as sputtering of W by C and O ions.