ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2018/08
形態種別	論文
査読	査読あり
標題	Surface morphology of Tungsten-F82H after high-heat flux testing using plasma-arc lamps
執筆形態	共著・編著（代表編著を除く）
掲載誌名	NUCLEAR MATERIALS AND ENERGY
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	16,pp.128-132
国際共著	国際共著
著者・共著者	K. Ibano,A. S. Sabau,K. Tokunaga,M. Akiyoshi,J. O. Kiggans,C. R. Schaich,Y. Katoh,Y. Ueda
概要	In this study, a high intensity plasma-arc lamp was used for high-heat flux cycling tests of W/F82H specimens. While no surface damage was observed for specimens tested for 100-200 cycles at a heat flux of 1.4 MW/m(2) pulse when the backside surface temperature was maintained below 550 degrees C, significant cracking occurred at higher temperatures. A simple analytical model for bimetallic materials indicated that the stress in the VPS-W layer is likely to exceed its failure stress solely due to the bilayer thermal stress. A finite element analysis of the state of stress and deformation confirmed that a significant stress also would occur at the W surface due to the rigid-body like constraint imposed by the clamp, which can be the main cause of the cracking.
DOI	10.1016/j.nme.2018.06.015
ISSN	2352-1791/2352-1791