ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
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言語種別 | 英語 |
発行・発表の年月 | 2011/08 |
形態種別 | 論文 |
査読 | 査読あり |
標題 | Exposure of tungsten nano-structure to TEXTOR edge plasma |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | JOURNAL OF NUCLEAR MATERIALS |
出版社・発行元 | ELSEVIER SCIENCE BV |
巻・号・頁 | 415(1),pp.S92-S95 |
担当区分 | 筆頭著者 |
国際共著 | 国際共著 |
著者・共著者 | Y. Ueda,K. Miyata,Y. Ohtsuka,H. T. Lee,M. Fukumoto,S. Brezinsek,J. W. Coenen,A. Kreter,A. Litnovsky,V. Philipps,B. Schweer,G. Sergienko,T. Hirai,A. Taguchi,Y. Torikai,K. Sugiyama,T. Tanabe,S. Kajita,N. Ohno |
概要 | W nano-structures (fuzz), produced in the linear high plasma device, NAGDIS, were exposed to TEXTOR edge plasmas (ohmic He/D mixed plasma and pure D plasma) to study formation, erosion and C deposition on W fuzz in tokamak plasmas for the first time. Fuzz layers were either completely eroded or covered by C deposit. There was no clear indication of W fuzz growth under the present conditions. There was no significant difference of C deposition between 'thick' fuzz (500-600 nm in thickness) and 'thin' fuzz (300-400 nm) in the He/D plasma. On the W fuzz surface. C deposition was enhanced probably due to reduction of effective sputtering yield and effective reflection coefficient of carbon ions, similar to roughness effects. Formation and erosion of W fuzz in tokamak devices and role of impurities are discussed. (C) 2010 Elsevier B.V. All rights reserved. |
DOI | 10.1016/j.jnucmat.2010.08.019 |
ISSN | 0022-3115/1873-4820 |