ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2011/08
形態種別	論文
査読	査読あり
標題	Application of tritium imaging plate technique to examine tritium behaviors on the surface and in the bulk of plasma-exposed materials
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	415(1),pp.S769-S772
国際共著	国際共著
著者・共著者	T. Otsuka,M. Shimada,R. Kolasinski,P. Calderoni,J. P. Sharpe,Y. Ueda,Y. Hatano,T. Tanabe
概要	We have applied a tritium imaging plate technique to measure the tritium distribution profile on surface and in bulk of various metal materials after exposure to a deuterium-tritium plasma in a linear plasma experimental apparatus. The experimental tritium concentration profiles in mm range are interpreted according to a simple hydrogen diffusion model in each metal. We found that a significant amount of tritium is localized in near surface regions and is clearly distinguishable from tritium diffused in the bulk. The amount of surface tritium is not likely correlated to bulk properties (diffusivity and solubility), but is related to trapping in surface defects or metal impurities such as oxide and carbide. (C) 2010 Elsevier B.V. All rights reserved.
DOI	10.1016/j.jnucmat.2010.11.046
ISSN	0022-3115/1873-4820