ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2011/10
形態種別	論文
査読	査読あり
標題	Nanoscale surface morphology of tungsten materials induced by Be-seeded D-He plasma exposure
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	417(1-3),pp.528-532
国際共著	国際共著
著者・共著者	K. Tokunaga,M. J. Baldwin,R. P. Doerner,D. Nishijima,H. Kurishita,T. Fujiwara,K. Araki,Y. Miyamoto,N. Ohno,Y. Ueda
概要	Ultra-fine grain W-(0.5, 1.5)wt%TiC alloys and stress relieved powder metallurgy W have been exposed to D-He mixed plasmas, some with added Be. The fixed exposure conditions are ion energy 60 eV and flux 3 to 6 x 10(22)/m(2) s. Sample temperature is 1123K and exposure times scanned 1000-11,000 s. Typical He/D ion is 0.2 and Be is 0.2% of the plasma. A remarkable change of the tungsten surfaces results from the plasma exposures. Formation of a nano-structured layer on the exposure surfaces is observed and believed to be related to He bubble formation. In addition, the growth rate of the nano-structured layer depends on the microstructure of the samples. In the case of a D-He plasma with Be, at 60 eV, plasma sputters away most of Be deposits with little effect on the He induced nano-structured layer formation. (C) 2011 Elsevier B.V. All rights reserved.
DOI	10.1016/j.jnucmat.2011.01.078
ISSN	0022-3115/1873-4820