ウエダ ヨシオ
Ueda Yoshio
上田 良夫 所属 追手門学院大学 理工学部 電気電子工学科 職種 教授 |
|
言語種別 | 英語 |
発行・発表の年月 | 2012 |
形態種別 | 論文 |
査読 | 査読あり |
標題 | Deuterium retention in graphite and its removal by inert gas glow discharge |
執筆形態 | 共著・編著(代表編著を除く) |
掲載誌名 | Plasma and Fusion Research |
掲載区分 | 国外 |
巻・号・頁 | 7(1) |
著者・共著者 | Akira Matsumoto,Yuji Yamauchi,Tomoaki Hino,Kiyohiko Nishimura,Yoshio Ueda |
概要 | The hydrogen isotope retention and its removal by inert gas glow discharge for graphite was investigated by residual gas analysis. The amount of retained hydrogen isotope in graphite during the deuterium glow discharge was about 1.0 × 1017 cm2, which was one order of magnitude larger than that in 316L stainless steel or tungsten. The removal ratio of hydrogen isotope by helium, neon and argon glow discharge cleaning were 49%, 22% and 6% respectively. These removal ratios were similar to those for the stainless steel, but larger than the tungsten. The removal ratio in graphite can be explained by both the depth distribution of incident deuteriumin thematerials and the etching depth. © 2012 The Japan Society of Plasma Science and Nuclear Fusion Research. |
DOI | 10.1585/pfr.7.2402090 |
ISSN | 1880-6821/1880-6821 |