ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2013
形態種別	論文
査読	査読あり
標題	Deuterium retention in Toughened, Fine-Grained Recrystallized Tungsten
執筆形態	共著・編著（代表編著を除く）
掲載誌名	Journal of Nuclear Materials
掲載区分	国外
巻・号・頁	438(SUPPL)
国際共著	国際共著
著者・共著者	Oya M,Uekita K,Lee H.T,Ohtsuka Y,Ueda Y,Kurishita H,Kreter A,Coenen J.W,Philipps V,Brezinsek S,Litnovsky A,Sugiyama K,Torikai Y
概要	Deuterium retention in Toughened, Fine-Grained Recrystallized W (TFGR W-1.1 wt%TiC) was studied, compared to pure W. D implantation was performed to a fluence of 1 × 1024m 2 at temperatures of 473-873 K, followed by TDS. It was found that D retention in TFGR W is higher than in pure W at all irradiation temperatures. Namely, at 673 K, D retention in TFGR W is six times higher than pure W. TDS spectrum of TFGR W irradiated at 573 Khas a large peak around ∼700 K with small shoulder up to ∼1100 K. In the case of D + He simultaneous irradiation, D retention is about 30% lower than for pure D. In addition, plasma exposure experiment was also conducted in TEXTOR, followed by NRA. Higher retention in TFGR W-1.1 wt%TiC could be attributed to high grain boundary diffusion (then trapping deeper into the bulk) and formation of TiD2. © 2013 Elsevier B.V. All rights reserved.
DOI	10.1016/j.jnucmat.2013.01.230
ISSN	0022-3115
Put Code(ORCID)	49208319
PermalinkURL	http://www.scopus.com/inward/record.url?eid=2-s2.0-84885429692&partnerID=MN8TOARS
researchmap用URL	http://orcid.org/0000-0002-7720-4023