ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2013/02/11
形態種別	論文
査読	査読あり
標題	Deuterium retention in VPS-W coated vanadium alloy (V-4Cr-4Ti)
執筆形態	共著・編著（代表編著を除く）
掲載誌名	Journal of Nuclear Materials
掲載区分	国外
巻・号・頁	438(SUPPL)
担当区分	筆頭著者
著者・共著者	Yoshio Ueda,Kazuhiro Uekita,Makoto Oya,Yusuke Ohtsuka,Takuya Nagasaka,Ryuta Kasada,Akihiko Kimura,Tomonori Tokunaga,Naoaki Yoshida
概要	D retention in a VPS W coated V alloy (V-4Cr-4Ti, NIFS Heat 2) was investigated by an ion beam irradiation with a HiFIT device. Irradiation temperature changed from 473 K to 773 K and ion fluence was 10 24 m 2 . In addition, during ion irradiation atmospheric pressure was 0.5 mTorr. It was found that ambient gas absorption was the dominant process for D retention. Ion irradiation could enhance gas absorption probably due to surface modification (oxide layer removal) and could produce ion induced trapping sites. Although these ion induced processes can be avoided by W coating layers, D retention is still significant for VPS-W coated V alloy. D trapping could be done mainly in V-alloy and its mechanisms could be related to some intrinsic defects in V alloy and formation of titanium hydride at elevated temperature. © 2013 Elsevier B.V. All rights reserved.
DOI	10.1016/j.jnucmat.2013.01.248
ISSN	0022-3115
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