ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2013/05
形態種別	論文
査読	査読あり
標題	STRUCTURE OF C DEPOSITION LAYERS UNDER VARIOUS DEPOSITION CONDITIONS
執筆形態	共著・編著（代表編著を除く）
掲載誌名	FUSION SCIENCE AND TECHNOLOGY
掲載区分	国外
出版社・発行元	AMER NUCLEAR SOC
巻・号・頁	63(1T),pp.371-373
国際共著	国際共著
著者・共著者	Y. Hamaji,T. Wada,H. T. Lee,Y. Ohtsuka,Y. Ueda,A. Kreter,V. Philipps,Y. Yamauchi,N. Ashikawa
概要	The structure of deposited carbon layers formed under various conditions ranging from small scale laboratory to large scale magnetic confinement devices was characterized using Raman spectroscopy. By comparing ion beam and TEXTOR experiments, the deposition temperature is found to be the dominant factor in three dimensional disorder of sp2 sites and sp3 ratio at T>493 K. While, no clear temperature dependence on properties of aromatic rings was observed, indicating other parameters responsible for the aromatic rings present in carbon deposition layers. The carbon layers from JET differed significantly, indicating influence of Be compound formation on Raman parameters.
DOI	10.13182/FST13-A16958
ISSN	1536-1055/1943-7641