ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
発行・発表の年月	2013/07
形態種別	論文
査読	査読あり
標題	Effects of glow discharge cleanings on hydrogen isotope removal for plasma facing materials
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
巻・号・頁	438(SUPPL),S1146-S1149頁
著者・共著者	Yamauchi Y,Matsumoto A,Kosaka Y,Kimura Y,Takeda K,Hino T,Nobuta Y,Nishimura K,Ueda Y
概要	The effect of the discharge cleanings on hydrogen isotope removal have been evaluated for graphite, stainless steel, tungsten, boron and titanium. For all materials, the helium glow discharge cleaning was the most effective on the hydrogen isotope removal among the inert gas discharges. High efficiency of energy transfer to target atom and deep projected range for helium ion might be responsible for the high removal fraction. The effect of argon glow discharge cleaning was small. The small removal fraction for the argon might be owing to re-deposition layer, which acted as a screening to the removal.
DOI	10.1016/j.jnucmat.2013.01.253
ISSN	0022-3115