ウエダ　ヨシオ   Ueda Yoshio   上田　良夫    所属   追手門学院大学  理工学部 電気電子工学科    職種   教授
言語種別	英語
発行・発表の年月	2013/11
形態種別	論文
査読	査読あり
標題	Properties of deposited layer formed by interaction with Be seeded D-He mixture plasma and tungsten
執筆形態	共著・編著（代表編著を除く）
掲載誌名	JOURNAL OF NUCLEAR MATERIALS
掲載区分	国外
出版社・発行元	ELSEVIER SCIENCE BV
巻・号・頁	442(1-3),pp.S313-S319
国際共著	国際共著
著者・共著者	K. Tokunaga,M. J. Baldwin,D. Nishijima,R. P. Doerner,S. Nagata,B. Tsuchiya,H. Kurishita,T. Fujiwara,K. Araki,Y. Miyamoto,N. Ohno,Y. Ueda
概要	Be-seeded, high-flux, deuterium/helium mixture plasma exposure experiments on tungsten target materials have been performed to simulate ITER all tungsten divertor erosion/modification and deposition phenomena. The exposure conditions are kept fixed at a typical low-ion-energy of 60 eV and a flux of 3-6 x 10(22)/m(2)/s. Sample temperature is 1123 K and plasma exposure times spanning 1050-10,100 s are explored. The typical ratio of He/D ions is 0.2 and Be content is 0.2%. A He-induced nanostructure layer is formed on the exposure surfaces of tungsten materials and the surface of the nanostructure is covered by a thin layer of Be and O.
DOI	10.1016/j.jnucmat.2013.05.006
ISSN	0022-3115/1873-4820